The Anritsu Thin Film Fab is housed in a 6000 square feet of class 100 / 10000 clean room facility, and is equipped with a complete line of manufacturing and test equipment to fabricate a variety of thin film devices, including equipment for Laser Drilling, Sputtering, Plating, Photo-Patterning, Resistor Trimming, Dicing and DC / RF testing.
The Fab equipment is designed to be flexible in order to support the high mix, low volume circuit needs of the fab's customers. Devices can be fabricated on a variety of form factors, including 4, 3.25, 2 and 1 inch square and round substrates and up to 125 mil in thickness. The Fab personnel have experience processing various types of materials, including Alumina, Fused Silica, Silicon, Glass, and even Titanium substrates.
The fab also has access to a variety of Reliability and Accelerated Stress tests equipment, and can perform various wire and ribbon bonding tests to ensure compliance to any MIL standards.
Please refer to the Microwave Technology Center - Equipment for more information on the Fab's facilities